3D reconstruction of 3D NAND memory etch profiles using FIB-SEM: identifying variances in etched hole patterns
3D reconstruction of 3D NAND memory etch profiles using FIB-SEM: identifying variances in etched hole patterns
10 months ago
spiedigitallibrary.org
As 3D NAND technology advances, the demand for greater deposition and etch intensity grows. Adding more memory layers requires not only innovative engineering but also precise material deposition and enhanced etch techniques. See how applying stress-compensating materials and leveraging molybdenum for improved conductivity ensure reliable scaling and more in the video below. | Lam Research Corporation
1:45
As 3D NAND technology advances, the demand for greater deposition and etch intensity grows. Adding more memory layers requires not only innovative engineering but also precise material deposition and enhanced etch techniques. See how applying stress-compensating materials and leveraging molybdenum for improved conductivity ensure reliable scaling and more in the video below. | Lam Research Corporation
571 viewsMar 25, 2025
FacebookLam Research Corporation
Are you ready to experience the next level of high-performance #AI devices driven by cutting-edge 3D NAND technology? Discover how our etching solutions push the boundaries of 3D NAND production from Global VP and GM of Etch Product Group Harmeet Singh. https://bit.ly/3yCkBVv | Lam Research Corporation
1:29
Are you ready to experience the next level of high-performance #AI devices driven by cutting-edge 3D NAND technology? Discover how our etching solutions push the boundaries of 3D NAND production from Global VP and GM of Etch Product Group Harmeet Singh. https://bit.ly/3yCkBVv | Lam Research Corporation
427 viewsSep 4, 2024
FacebookLam Research Corporation
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